Preparation and characterization of CuxO/Cu thin films by reactive d.c. magnetron sputtering

Abstract

CuxO/Cu thin films were prepared by reactive d.c. magnetron sputtering on (100) Si substrates. Microstructures of the films were significantly affected by substrate temperature, oxygen flow rate and applied bias. It was observed that the films mainly crystallized to Cu2O with trace amount of CuO under strongly oxidizing deposition conditions. Relative amount of CuO increased with increasing substrate temperature, oxygen flow rate and decreasing bias. It was observed that the films fully crystallized to CuO with tenorite structure after heat-treated at 600degreesC for 60 minutes. General appearances of the films were uniform and reddish brown in color.