New technique for measuring the microwave penetration depth in high-Tc superconducting thin films

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dc.contributor.authorDurusoy, HZ
dc.contributor.authorAktas, B
dc.contributor.authorYilgin, R
dc.contributor.authorTerada, N
dc.contributor.authorIchikawa, M
dc.contributor.authorKaneda, T
dc.contributor.authorTagirov, LR
dc.date.accessioned2025-10-29T11:20:55Z
dc.date.issued2000
dc.departmentGebze Teknik Üniversitesi
dc.description22nd International Conference on Low Temperature Physics -- AUG 04-11, 1999 -- HELSINKI UNIV TECHNOL, HELSINKI, FINLAND
dc.description.abstractThe ferromagnetic resonance (FMR) technique has been used to obtain the microwave (MW) penetration depth in high-temperature superconductor (HTSC) thin film. An FMR-signal-generating thin permalloy film was sandwiched in between of two YBa2Cu3O7 films to probe the MW field penetrating through the films. Below the superconducting transition temperature T-c the HTSC films started to screen the marker inside the sandwich. The low-temperature saturation value lambda(ab) similar or equal to 1250 Angstrom at 25 K has been deduced for our c-axis films from the temperature dependence of the FMR signal intensity below T-c. (C) 2000 Elsevier Science B.V. All rights reserved.
dc.description.sponsorshipCommiss C5 low Temp Phys,Int Union Pure & Appl Phys,Acad Finland,Helsinki Univ Technol,Int Assoc Promot Sci,Oxford Instruments Ltd,FortumCorp,Nokia Grp,Finnair Ltd,Datex Engstrom Ltd,Finnish Phys Soc,Picker Nordstar Ltd,Neuromag ltd,SAP Finland Ltd,Espoo Elect Ltd,Outokumpu Ltd,City Espoo,Finnish Acad Sci & Letters,DCA-Instruments Ltd,Vaisala Ltd
dc.identifier.doi10.1016/S0921-4526(99)02268-1
dc.identifier.endpage954
dc.identifier.issn0921-4526
dc.identifier.orcid0000-0002-1549-7940
dc.identifier.scopus2-s2.0-0033690549
dc.identifier.scopusqualityQ2
dc.identifier.startpage953
dc.identifier.urihttps://doi.org/10.1016/S0921-4526(99)02268-1
dc.identifier.urihttps://hdl.handle.net/20.500.14854/8792
dc.identifier.volume284
dc.identifier.wosWOS:000087311700475
dc.identifier.wosqualityQ3
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Science Bv
dc.relation.ispartofPhysica B
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WOS_20251020
dc.subjectferromagnetic resonance
dc.subjectmicrowave surface impedance
dc.subjectpenetration depth
dc.subjectYBaCuO films
dc.titleNew technique for measuring the microwave penetration depth in high-Tc superconducting thin films
dc.typeConference Object

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